Patent
1980-09-05
1983-06-21
Arnold, Bruce Y.
350320, G02B 518
Patent
active
043890946
ABSTRACT:
A process is disclosed which consists of choosing the wavelength of a plane incident wave to lie in the range 2d/3.ltoreq..lambda..ltoreq.2d, where d is the pitch of the slits so that there exist only two diffracted orders for each of the two half-spaces which are situated on each side of the plane of the mask, and in adjusting the angle of incidence of the plane wave so that the reflected diffracted order which is not the specularly reflected order is propagated in the direction opposite that of the incident wave.
REFERENCES:
patent: 1744642 (1930-01-01), Kondo
patent: 3680945 (1972-08-01), Sheridon
patent: 4132479 (1979-01-01), Dubroeucq et al.
Neviere Michel J.
Roumiguieres Jean-Louis A.
Arnold Bruce Y.
Roumiguieres Jean-Louis A.
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