Process for brush cleaning

Details Process for brush cleaning Process for brush cleaning

1995-11-08

1997-12-02

Soderquist, Arlen

Cleaning and liquid contact with solids

Processes

Combined

15 883, 15302, 134 13, 134 29, 134 32, 134 34, 134902, B08B 704, B08B 300, B08B 102, A47L 1500

Patent

active

056931484

ABSTRACT:
A process for brush cleaning used in semiconductor wafer scrubbing systems. A process for brush cleaning that eliminates and/or reduces the load-up of brushes with contaminants. This brush cleaning process changes the pH level of a brush to repel contaminants that are on the brush. This process extends the useful life of the brush without significantly decreasing the throughput of the scrubbing system.

REFERENCES:
patent: 3970471 (1976-07-01), Banks et al.
patent: 4116714 (1978-09-01), Basi
patent: 4569695 (1986-02-01), Yamashita et al.
patent: 4715392 (1987-12-01), Abe et al.
patent: 5351360 (1994-10-01), Suzuki et al.
patent: 5375291 (1994-12-01), Tateyama et al.
patent: 5442828 (1995-08-01), Lutz
patent: 5475889 (1995-12-01), Thrasher et al.
patent: 5485644 (1996-01-01), Shinbara et al.
patent: 5548505 (1996-08-01), Simmons et al.
patent: 5555177 (1996-09-01), Simmons

Affiliated with

Also associated with

Rating

Process for brush cleaning does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for brush cleaning, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for brush cleaning will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-797937