Process for bonding crystalline substrates with different crysta

Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates – Thinning of semiconductor substrate

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438977, 156247, H01L 21762

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active

059666226

ABSTRACT:
A process for device fabrication is disclosed in which two substrates having different crystal lattices are bound together. In the process a layer of material that has a crystal lattice similar to the crystal lattices of the first substrate is formed on the surface of the second substrate. The thickness of the layer is about 1 nm to about 2 nm. The layer of material is then bound to the surface of the first substrate.

REFERENCES:
patent: 4891329 (1990-01-01), Reisman et al.
patent: 5346848 (1994-09-01), Grupen-Sheansky et al.
patent: 5391257 (1995-02-01), Sullivan et al.
Chan, W. K. et al., "Van der Waals Bonded III-V Films for Optoelectronics", Extended Abstracts of the Fall Meeting of the Electrochemical Society, vol. 91-2, p. 689, Oct. 1991.
Goetz, G.G., "Generalized Reaction Bonding", Extended Abstracts of the Fall Meeting of the Electrochemical Society, vol.91-2, p. 679, Oct. 1991.
"Silicon Heterointerface Photodetector," by Hawkins, A. R. et al., Apple. Phys. Lett., 68 (26) pp. 3692-3694 (Jun. 24, 1996).
"Physics and Applications of Ge sub x Si sub 1-x /Si Strained-Layer Heterostructure", by People, R., IEEE Journal of Quantum Electronics, vol. QE-22 No. 9, pp. 1696-1710 (Sep.1996).
Lammasniemi et al., Institute of Electrical and Electronics Engineers, "Bonding of Indium Phosphide Layers on Silicon Substrate", pp. 361-364, Apr. 19, 1993.
Hawkins et al., Applied Physics Letters, "Silicon Heterointerface Photodetector", vol. 68, No. 26, pp. 3692-3694, Jun. 24, 1996.
Totoki et al., Japanese Journal of Applied Physics, "Direct Bonding Between InP and Gd.sub.3 Ga.sub.5 O.sub.12 for integrating Semiconductor and Magnetooptic Devices", vol. 34, No. 2A, pp. 510-514, Feb. 1, 1995.
Hawkins et al., Applied Physics Letters, "High Gain-Bandwidth-Product Silcon Heterointerface Photodetector", vol. 70, No. 3 pp. 303-305, Jan. 20, 1997.

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