Process for automatic alignment of two objects to be adjusted wi

Details Process for automatic alignment of two objects to be adjusted wi Process for automatic alignment of two objects to be adjusted wi

1979-05-21

1981-02-24

Britton, Howard W.

Facsimile and static presentation processing

Facsimile

Specific signal processing circuitry

358903, 364515, H04N 718

Patent

active

042531128

ABSTRACT:
Mask adjustment is automated in order to be able to adjust edges having extremely low contrast on silicon disks (wafer) with the highest precision possible with respect to edges on the mask. Different straight lines which extend orthogonally with respect to one another on the disk and the mask are integrated line-wise by line-wise opto-electronic scanning of the intensity of brightness on a parallel basis. The values obtained are stored and the difference in values of successive lines is formed and centroids are formed from the resultant course, which are further combined into a mean value which is to be assigned to the position of the center line of a stroke on the disk or, respectively, mask. The process is likewise carried out for both directions (x,y) on the basis of the corresponding adjustment structures on the mask and the disk.

REFERENCES:
patent: 3712740 (1973-01-01), Hennings
patent: 3988535 (1976-10-01), Hickman

Affiliated with

Also associated with

Rating

Process for automatic alignment of two objects to be adjusted wi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for automatic alignment of two objects to be adjusted wi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for automatic alignment of two objects to be adjusted wi will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1412262