Chemistry: electrical and wave energy – Processes and products
Patent
1984-06-11
1985-03-05
Andrews, R. L.
Chemistry: electrical and wave energy
Processes and products
204 383, 204 387, 2041294, 20412975, 101456, 101459, C25F 304, C25D 1116, C25D 1118
Patent
active
045029253
ABSTRACT:
A method for treating an aluminum sheet useful for lithography by etching said sheet in an aqueous bath containing up to about 25% of nitric and/or hydrochloric acids and from about 1% to about 25% of an inorganic fluorine containing acid or salt thereof. Said etching step is sequentially followed by electrochemical graining and anodizing process steps.
REFERENCES:
patent: 4229266 (1980-10-01), Usbeck
patent: 4242417 (1980-12-01), Huang
patent: 4331479 (1982-05-01), Toyama
patent: 4336113 (1982-06-01), Walls et al.
patent: 4374710 (1983-02-01), Walls
patent: 4396468 (1983-08-01), Walls
American Hoechst Corporation
Andrews R. L.
Roberts Richard S.
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