Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Patent
1992-04-10
1993-07-13
Straub, Gary P.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
423219, 423220, 423235, 4232421, 423246, B01D 5300
Patent
active
052271447
ABSTRACT:
Process for air decontamination consists of circulating air in a soaking chamber through several air-permeable barriers which are continuously bathed in solutions containing various chemical reagents which remove toxic, solid and gaseous pollutants from the air. The first of these barriers contains water to eliminate all solid particles suspended in the gas flow, either animal, vegetal or mineral in origin, and to also start eliminating carbon monoxide; the second barrier contains a hydroxide of some alkali metal for the complete elimination of nitrogen dioxide, hydrogen sulfide and prussic acid, as well as part of the ozone; the third barrier contains sulfuric acid and eliminates carbon monoxide; the fourth barrier contains a hydroxide of some alkali earth metal, eliminating carbon dioxide; the fifth barrier contains sodium nitrite and eliminates ozone; the sixth barrier contains potassium permanganate eliminating sulfur dioxide; and the seventh barrier contains a diluted solution of sodium hypochlorite to eliminate all vestiges of any of the reagents.
REFERENCES:
patent: 3383164 (1968-05-01), Harkness
patent: 3998714 (1976-12-01), Armstrong
patent: 4369167 (1983-01-01), Weir, Jr.
patent: 4839147 (1989-06-01), Lindbauer et al.
patent: 5096680 (1992-03-01), Lindbauer et al.
patent: 5120515 (1992-01-01), Audeh et al.
Straub Gary P.
Vanoy Timothy C.
LandOfFree
Process for air decontamination does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for air decontamination, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for air decontamination will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2310203