Process for a thermal treatment of a polysilazane containing .tb

Details Process for a thermal treatment of a polysilazane containing .tb Process for a thermal treatment of a polysilazane containing .tb

1986-06-25

1987-04-07

Shaver, Paul F.

Organic compounds -- part of the class 532-570 series

Organic compounds

Silicon containing

528 28, 528 38, 423324, C67F 710

Patent

active

046563008

ABSTRACT:
A process for the thermal treatment of a polysilazane at a temperature from about 40.degree. C. to 220.degree. C. The polysilazane contains on average at least two, preferably at least three, .tbd.SiH groups per molecule and at least two ##STR1## groups and, if appropriate, unsaturated aliphatic hydrocarbon groups bonded to the silicon atoms. The polysilazanes treated in this manner have good thermal behavior and can be used in particular as precursors of ceramic products with a high yield of inorganic products.

REFERENCES:
patent: 4340619 (1982-07-01), Gaul
patent: 4482669 (1984-11-01), Seyferth et al.
patent: 4482689 (1984-11-01), Haluska
patent: 4540803 (1985-09-01), Cannady

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