Process flow design at the module effects level through the use

Details Process flow design at the module effects level through the use Process flow design at the module effects level through the use

1997-04-14

1999-06-15

DeCady, Albert

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34646802, 34646828, 34614001, G06F 1900

Patent

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059126787

ABSTRACT:
Methods and processes to reduce the cost and cycle time of designing manufacturing flows are described, particularly for microelectronic integrated circuit processes. One embodiment of the present invention is a method which divides the task of designing process flows into a number of abstraction levels and provides mechanisms to translate between these levels of abstraction. The process is divided into a number of modules each having process constraints. Process constraints are propagated backwards from the final module to the first module, and may also be propagated forward from earlier modules to later modules of needed. This approach results in a top-down design methodology where requirements from higher levels of abstraction are successively reduced to lower abstraction levels, while meeting the constraints imposed by the lower levels.

REFERENCES:
patent: 5552996 (1996-09-01), Hoffman et al.
patent: 5598344 (1997-01-01), Dangelo et al.
Leang, et al., "A Control System for Photolithographic Sequences", IEEE Transactions on Semiconductor Manufacturing, vol. 9, No. 2, May 1996, pp. 191-207.
Saxena, et al., "A Methodology for the Top-Down Synthesis of Semiconductor Process Flows", IEEE International Symposium on Semiconductor Manufacturing (1995), pp. 36-40.
Klein, "A Structured Methodology for IC Photolithography Synthesis in Semiconductor Manufacturing", IEEE Transactions on Semiconductor Manufacturing, vol. 1, No. 1, Feb. 1988, pp. 28-35.

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