Process control system

Coating processes – Measuring – testing – or indicating – Thickness or uniformity of thickness determined

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Details

427 52, 427120, 427249, 427251, 4272552, 4272555, 4272557, 118665, 118620, 118718, 118725, B05D 500

Patent

active

043584730

ABSTRACT:
This invention relates to a process control system and method of controlling a chemical vapor deposition (CVD) process where a coating is deposited on a substrate heated by passing a current through the substrate to create a heating zone. The control system relies on detecting a signal induced on the coated substrate outside of the heating zone and using the induced signal to control one or more process parameters.

REFERENCES:
patent: 3356529 (1967-12-01), Kiser et al.
patent: 3539963 (1970-11-01), Schrader
patent: 3572286 (1971-03-01), Forney
patent: 3846224 (1974-11-01), Leclercq et al.
patent: 3907607 (1975-09-01), Chu et al.
patent: 4031851 (1977-06-01), Camahort
patent: 4068037 (1978-01-01), Debolt et al.
patent: 4300094 (1981-11-01), Piso et al.
Vossen et al., Thin Film Processes, 1978, Academic Press, NY, NY, pp. 287-289.

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