Process control for pulsed laser deposition using raman spectros

Details Process control for pulsed laser deposition using raman spectros Process control for pulsed laser deposition using raman spectros

1997-04-30

2000-03-14

Wachsman, Hal

Data processing: measuring, calibrating, or testing

Measurement system

Dimensional determination

702170, 356301, 356381, G01B 1106

Patent

active

060385251

ABSTRACT:
A method of controlling a pulsed laser deposition process. A spectroscope is used to acquire Raman response data from a substrate as it is being coated with a film. A processor compares the response data to reference data, which may represent an uncoated substrate or an ideal film. In the former case, the attenuation of the response signal is used to indicate film thickness. In the former case, the peak characteristics of the film can be used to indicate its chemical properties. The processor may be further programmed to compare deposition rates, reaction rates, and transport rates to model data. The processor makes decisions regarding equipment control based on these comparisons. It may access heuristic rules to aid in decision making where several factors are involved.

REFERENCES:
patent: 4024291 (1977-05-01), Wilmanns
patent: 4311725 (1982-01-01), Holland
patent: 4837044 (1989-06-01), Muraka et al.
patent: 5009485 (1991-04-01), Hall
patent: 5017007 (1991-05-01), Milne et al.
patent: 5112642 (1992-05-01), Wajid
patent: 5116121 (1992-05-01), Knoll et al.
patent: 5131752 (1992-07-01), Yu et al.
patent: 5208648 (1993-05-01), Batchelder et al.
patent: 5354575 (1994-10-01), Dagenais et al.
patent: 5425964 (1995-06-01), Southwell et al.
patent: 5493401 (1996-02-01), Horie et al.
patent: 5518759 (1996-05-01), Sevillano et al.
patent: 5525156 (1996-06-01), Manada et al.
patent: 5535128 (1996-07-01), Laube et al.
patent: 5552327 (1996-09-01), Bachmann et al.
patent: 5665214 (1997-09-01), Iturralde
patent: 5786893 (1998-07-01), Fink et al.
patent: 5835221 (1998-11-01), Lee et al.

Affiliated with

Also associated with

Rating

Process control for pulsed laser deposition using raman spectros does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process control for pulsed laser deposition using raman spectros, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process control for pulsed laser deposition using raman spectros will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-178666