Process control circuit for metal-depositing baths

Fluid handling – Self-proportioning or correlating systems – Mixture condition maintaining or sensing

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Details

204228, G05D 1113, C25B 1502, C25D 2114

Patent

active

040686779

ABSTRACT:
A process control circuit which is adapted for the control and monitoring of a plurality of parameters in one or more metal-depositing baths, has parameter control circuit blocks for each of the parameters to be measured. Each of the parameter control circuit blocks has a measuring stage for producing a measured value corresponding to one of the parameters, a calibration stage for calibrating the measuring stage, a comparison stage for comparing the measured value to a stored nominal value, and a dosing circuit which is connected to the comparator and which doses the metal-depositing bath in response to a comparison signal from the comparator.

REFERENCES:
patent: 3361150 (1968-01-01), Horner
patent: 3532102 (1970-10-01), Glassey
patent: 3607549 (1971-09-01), Bielefeld, Jr.
patent: 3650196 (1972-03-01), Hosoe et al.
patent: 3674672 (1972-07-01), Whitesell

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