Process control apparatus, systems, and methods

Details Process control apparatus, systems, and methods Process control apparatus, systems, and methods

2006-02-14

2006-02-14

Tran, Khoi H. (Department: 3651)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Article handling

C700S121000, C438S014000

Reexamination Certificate

active

06999848

ABSTRACT:
An apparatus and a system, as well as a method and article, may operate to receive a critical dimension associated with each wafer included in a lot of wafers at a station controller coupled to a metrology tool, calculate a modified recipe time associated with each wafer in the lot based on the critical dimension and a base time, and send the modified recipe time in a message to a station controller coupled to an etch tool to process each of the wafers included in the lot.

REFERENCES:
patent: 5866437 (1999-02-01), Chen et al.
patent: 5926690 (1999-07-01), Toprac et al.
patent: 6041270 (2000-03-01), Steffan et al.
patent: 6320402 (2001-11-01), Phan et al.
patent: 6604012 (2003-08-01), Cho et al.
patent: 6625497 (2003-09-01), Fairbairn et al.
IMA News: The Newsletter of the Integrated Measurement Association, vol. III. Issue 1, (May 30, 2003), pp. 1-9.

Affiliated with

Also associated with

Rating

Process control apparatus, systems, and methods does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process control apparatus, systems, and methods, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process control apparatus, systems, and methods will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3703490