Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2006-05-26
2009-12-01
Vinh, Lan (Department: 1792)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S005000, C438S009000, C438S710000, C216S059000
Reexamination Certificate
active
07625824
ABSTRACT:
The present invention provides a method for creating a process change detection algorithm. An evolutionary computing technique is applied to at least one process dataset containing at least one known process change. The evolutionary computing technique will generate a process state function (or a scaling coefficient set for use with an existing process state function) that optimizes detection of the known process changes. The generated process state function or coefficients can then be applied thereafter to future datasets (either in real-time or after processing) to detect process changes.
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Kauget Harvey
Oerlikon USA, Inc.
Vinh Lan
LandOfFree
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