Process and system for the treatment of substrates using ions fr

Details Process and system for the treatment of substrates using ions fr Process and system for the treatment of substrates using ions fr

1998-06-16

2000-04-04

Diamond, Alan

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

20429841, 20419216, 20419212, 20419234, 20419232, 20429831, 20429836, 20429807, 20429815, 20429816, 20429817, C23C 1434

Patent

active

060456671

ABSTRACT:
A process and system for the treatment of substrates using ions from a low-voltage arc discharge. Before coating with an anti-wear layer, the substrates are etched by ion bombardment in order to enhance the adhesion of the anti-wear layer, and the layer which is growing is influenced during the coating by ion bombardment in order to improve the elastic behavior of brittle hard-material layers. The process increases the capacity of the plasma of a low-voltage arc discharge to penetrate the three-dimensional structures of tools, machine parts and items of practical use, and thus effects more uniform treatment by the ion bombardment and therefore better layer properties in indentations. A prerequisite is a hollow substrate arrangement in which the discharge is not prevented from spreading to the substrates. The process, and the system suitable therefore, can be combined with many PVD coating sources, for example with arc sources, cathodic sputtering sources, or a low-voltage arc source.

REFERENCES:
patent: 4197175 (1980-04-01), Moll et al.
patent: 4254159 (1981-03-01), Pulker et al.
patent: 5384018 (1995-01-01), Ramm et al.
patent: 5690796 (1997-11-01), DuPont et al.
patent: 5709784 (1998-01-01), Braendle et al.

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