Process and system for the control of the focusing of a beam of

Details Process and system for the control of the focusing of a beam of Process and system for the control of the focusing of a beam of

1990-05-08

1991-06-04

Berman, Jack I.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250396R, B23K 1500, H01J 328

Patent

active

050216694

ABSTRACT:
A process and a system are disclosed for controlling the focusing of a beam of monopolar charged particles which is used, for example, to vaporize substances in vacuum coating systems. The beam (S) has a cross-sectional area (Q) in a plane (E.sub.1) transverse to the axis of the beam. Perpendicular to plane (E.sub.1) there is a plane (E.sub.2), the surface normal (R) to which indicates the direction in which the change in the cross-sectional area (Q) is to occur. According to the invention, flux density fields (B.sub.1, B.sub.2) are applied, which are parallel on opposite sides to plane (E.sub.2) but have opposing directions. As a result, the change in the focusing of the beam has essentially no effect on any deflection of the beam; that is, it is possible to control the focusing without exerting any significant effect on the deflection.

REFERENCES:
patent: 3420977 (1969-01-01), Hanks et al.
patent: 3753034 (1973-08-01), Spicer
patent: 4064352 (1977-12-01), Mann
patent: 4464573 (1984-08-01), Dalglish
patent: 4673794 (1987-06-01), Irie et al.

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