Process and system for purifying gases

Gas separation: processes – With control responsive to sensed condition – Concentration sensed

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C095S001000, C095S003000, C095S004000, C095S005000, C095S006000, C095S007000, C095S008000, C095S009000, C095S010000, C095S011000, C095S013000, C095S015000, C095S016000, C095S017000, C095S018000, C095S019000, C095S020000, C095S021000, C095S022000, C095S023000, C095S025000, C073S001010, C073S001020, C422S083000, C422S129000, C422S105000, C422S108000, C422S110000, C422S111000, C422S112000, C436S043000, C436S177000, C436S178000, C436S181000

Reexamination Certificate

active

07097689

ABSTRACT:
A process and system for purifying an impure gas to produce a purified gas in a gas purification system and protecting the system from damage by a) passing a portion of a first gas stream into a reactor vessel, which exits as a second purified gas stream; b) combining a portion of the second purified gas stream with another portion of the first gas stream to form a combined gas stream; and c) passing the combined gas stream into a sensing device to regulate the flow of the first and second gas streams into the reactor vessel.

REFERENCES:
patent: 5150604 (1992-09-01), Succi et al.
patent: 5265031 (1993-11-01), Malczewski
patent: 5917066 (1999-06-01), Eisenmann et al.
patent: 6068685 (2000-05-01), Lorimer et al.
patent: 6156105 (2000-12-01), Lorimer et al.
patent: 6168645 (2001-01-01), Succi et al.
patent: 6514313 (2003-02-01), Spiegelman et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process and system for purifying gases does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process and system for purifying gases, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and system for purifying gases will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3716475

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.