Process and system for determining photoresist development endpo

Details Process and system for determining photoresist development endpo Process and system for determining photoresist development endpo

1987-12-17

1989-08-15

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, 430325, 156626, 356436, 356442, 354298, 250573, G03C 524

Patent

active

048574309

ABSTRACT:
A system and method for determining the pattern development endpoint of a photoresist polymer during spin/spray processing of a semiconductor wafer utilizes the optical transmission of the waster developer liquid during the pattern develop process to determine when the developing is completed.

REFERENCES:
patent: 4023193 (1977-05-01), Schroter et al.
patent: 4166702 (1979-09-01), Okamoto et al.
patent: 4201579 (1980-05-01), Robinson et al.
patent: 4429983 (1984-02-01), Cortellino et al.
patent: 4593986 (1986-06-01), Tomisawa et al.

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