Process and structure of an integrated vacuum microelectronic de

Details Process and structure of an integrated vacuum microelectronic de Process and structure of an integrated vacuum microelectronic de

1992-03-05

1993-04-20

Seidel, Richard K.

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

445 50, 445 51, 437927, H01J 912

Patent

active

052037312

ABSTRACT:
The present invention relates generally to a new integrated Vacuum Microelectronic Device (VMD) and a method for making the same. Vacuum Microelectronic Devices require several unique three dimensional structures: a sharp field emission tip, accurate alignment of the tip inside a control grid structure in a vacuum environment, and an anode to collect electrons emitted by the tip. Also disclosed is a new structure and a process for forming diodes, triodes, tetrodes, pentodes and other similar structures. The final structure made can also be connected to other similar VMD devices or to other electronic devices.

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