Process and means for producing films for use in electronics and

Details Process and means for producing films for use in electronics and Process and means for producing films for use in electronics and

1988-10-14

1991-02-05

Silverman, Stanley

Coating apparatus

Gas or vapor deposition

With treating means

118723, 118724, 118725, 118728, 427 38, 427 39, C23C 1600

Patent

active

049895435

ABSTRACT:
Apparatus for producing thin film materials in a plasma deposit process. An enclosure is provided including a plasma zone. The apparatus removes non-deposited, residual gaseous reagents from the enclosure after heating the plasma zone for a predetermined time. An airtight chamber surrounds the enclosure and is kept at a pressure lower than the pressure within the enclosure. A screen is provided for directing heat to the enclosure, while maintaining the chamber walls at a lower temperature. In one embodiment of the invention, metal bellows are provided to apply a substrate support plate against a side wall of the enclosure sealing the substrate support with one of the side walls of the enclosure.

REFERENCES:
patent: 4047496 (1977-09-01), McNeilly et al.
patent: 4798739 (1989-01-01), Schmitt

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