Process and mask for ion beam etching of fine patterns

Details Process and mask for ion beam etching of fine patterns Process and mask for ion beam etching of fine patterns

1978-12-04

1981-06-23

Albritton, C. L.

Electric heating

Metal heating

By arc

219121EM, 219121EE, 219121ER, 219121LJ, 219121LP, 156643, 204192EC, 204192N, 427 35, 427 91, B23K 1500, C23F 102, C23C 1500, H01L 21302

Patent

active

042752868

ABSTRACT:
The specification describes a process for ion beam etching fine patterns in a substrate using a protected resist mask which prevents erosion of the mask. First, a resist pattern is formed on the surface of a substrate to expose pre-selected areas of the substrate. Next, a selected material is deposited on the resist mask at a predetermined controlled angle of incidence with respect to the surface of the mask to form a relatively thin protective layer on the resist mask, having edges and patterns replicated from the edges and patterns of the resist mask and a negligible amount of the selected material deposited on the exposed substrate. Then, a beam of ions at a chosen energy is directed through openings in the protected mask to the substrate to etch the pre-selected areas. During etching, the protective layer on the resist prevents erosion of the resist mask and provides improved pattern definition for the etched region. In a preferred embodiment, metal contacts to the etched regions are subsequently formed by depositing a selected metal from a directional source and then lifting off the resist and the undesired metal.

REFERENCES:
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patent: 4117301 (1978-09-01), Goel et al.
patent: 4128467 (1978-12-01), Fischer
patent: 4145459 (1979-03-01), Goel
patent: 4153529 (1979-05-01), Little et al.
Hatzakis et al., "Forming a Sputter-Etching Mask", IBM Tech. Disc. Bull., vol. 12, No. 11, Apr. 1970, p. 1945.
Blakeslee et al., "Aluminum Etch Mask for Plasma Etching", IBM Tech. Disc. Bull., vol. 21, No. 3, Aug. 1978, pp. 1256-1258.
Hosaka et al., "Influence of Sample Inclination and Rotation During Ion-Beam Etching on Ion-Etched Structures", J. Vac. Sc. Techol., 15(5), Sep./Oct. 1978, pp. 1712-1717.

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