Refrigeration – Cryogenic treatment of gas or gas mixture – Separation of gas mixture
Patent
1995-04-10
1996-12-24
Capossela, Ronald C.
Refrigeration
Cryogenic treatment of gas or gas mixture
Separation of gas mixture
62654, F25J 302
Patent
active
055864511
ABSTRACT:
Process and installation for the production of gaseous oxygen under pressure by cryogenic distillation of air in a double column (5) comprising a medium pressure column (6) and a low pressure column (7). Rich liquid from the medium pressure column is divided into first and second liquid fractions which are sent to different levels in the low pressure column (7). These different levels are both below the level of withdrawal of impure nitrogen from the low pressure column (7). A fluid enriched in argon is withdrawn from the low pressure column (7) and distilled in an argon column (16). Liquid enriched in oxygen is withdrawn from a lower portion of the low pressure column (7). The two fractions of rich liquid are cooled to different temperatures before being sent to the low pressure column (7). A portion of the supply air is blown into an intermediate level of the low pressure column (7) and the levels of injection of the rich liquid are not below this intermediate level.
REFERENCES:
patent: 3214925 (1965-11-01), Becker
patent: 4994098 (1991-02-01), Agrawal et al.
patent: 5076823 (1991-12-01), Hansel et al.
patent: 5079923 (1992-01-01), Grenier
patent: 5228296 (1993-07-01), Howard
Fraysse Philippe
Koeberle Yves
Capossela Ronald C.
L'Air Liquide Societe Anonyme Pour l'Etude et, l'Exploitation de
LandOfFree
Process and installation for the production of oxygen by distill does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process and installation for the production of oxygen by distill, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and installation for the production of oxygen by distill will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1172407