Process and device for the dissolution of gas in liquid

Gas and liquid contact apparatus – Fluid distribution – Pumping

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Details

261 361, 261120, 261115, 261DIG75, B01F 304

Patent

active

047357509

DESCRIPTION:

BRIEF SUMMARY
The invention relates to a process and device for mixing and dissolving gas in liquid, in which the liquid is supplied under a first, high pressure to a nozzle plate whence it exits at a second, lower pressure into a reaction space which comprises approximately the same cross section as the nozzle plate, of which the length is a multiple of the smallest transverse dimension of the nozzle plate, into which the gas flows in the region of the nozzle plate and out of which a gas/solution mixture flows laterally on the discharge side and is collected in a solution tank in which undissolved gas separates from the solution and from which this gas re-enters the reaction space, sucked in by the liquid stream, and the solution is drawn off from the solution tank.
The process known from Swiss Pat. No. 370057 exhibits the disadvantage that the liquid only comes into contact with the gas for a short time, fractions of seconds, as a fine jet or droplet mist. If necessary, gas bubbles are also introduced into the collected liquid, so that a further dissolution of the gas thereby takes place in the liquid. However, these gas bubbles are relatively large and their residence time in the liquid is therefore also short, such that one run only results in partial saturation of the solution.
It is also known to supply a gas to a liquid under pressure by distributor nozzles. Here also, dissolution of the gas only occurs for as long and to such an extent as is possible before the gas bubbles formed rise to the surface after a few seconds.
The problem on which the invention is based is that of providing a process and a device in which the liquid is intensively swirled and mixed with the gas in such a way that extensive saturation of the liquid thereby occurs at the prevailing pressure without it being necessary repeatedly to circulate the liquid through the nozzles by means of pumps and with it being possible to use relatively wide nozzles of comparatively low resistance in the nozzle plate.
The problem is solved in that the gas/solution mixture is accumulated to a level surrounding the reaction space and the reaction space is immersed to approximately 2/3 of its length below the level, the solution being drawn off at a third, low pressure level as a supersaturated solution.
Advantageous embodiments are disclosed in the examples and subclaims. The process and the device are characterized by simplicity. No pumps are needed for repeatedly circulating the liquid, and the nozzle bores in the nozzle plate can be relatively wide, so that it is not necessary to filter the liquid supplied of particles and suspended substances, if sea or river water is to be aerated, for example. Even waste water to be purified or other liquids loaded with substances in suspension can be supplied to the device, and it is possible to work with only a few bar pressure so that no high pressure pumps and plant parts are necessary. For purifying baths it is possible, for example, to work directly at water main pressure, so that no pump is required.
It is especially advantageous to construct the nozzles in the nozzle plate in two different embodiments. The nozzles located on the outer ring are drilled cylindrically as power jet nozzles, so that by their high jet speed they exert suction on the surrounding gas. The nozzles located on the inner rings, on the other hand, enlarge conically in a Venturi design, so that the jets leaving them effect an intensive mixing of the liquid with the gas.
The reaction space length is appropriately a multiple of, for example six times, the nozzle plate diameter. The lower outlets are arranged at a height of around 0.5 times the reaction space diameter.
The total nozzle plate flow resistance is selected, for example, so that approximately half the liquid pressure available serves the purpose of nozzle plate throughflow and the other half serves to intensify the dissolution process, if a highly supersaturated solution is to be obtained at the lowest pressure level, which solution has a high temporal durability of many hours and rel

REFERENCES:
patent: 3799511 (1974-03-01), Svantesson
patent: 3865908 (1975-02-01), Hirshon
patent: 4043771 (1977-08-01), Anand
patent: 4466928 (1984-08-01), Kos
patent: 4560474 (1985-12-01), Holik
patent: 4564480 (1986-01-01), Kamelmacher
patent: 4597877 (1986-07-01), Gaia

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