Process and device for the deposition of thin layers and product

Details Process and device for the deposition of thin layers and product Process and device for the deposition of thin layers and product

1990-08-09

1993-04-27

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

427569, 427578, 427579, 427491, B05D 306

Patent

active

052060608

ABSTRACT:
This invention relates to a process and a device for the deposition of thin layers on a substrate using a plasma-CVD technique. The substrate itself, which previously has been made conductive by the deposition of conductive layers, is used as an electrode to create the discharge. In particular, the technique can be applied to the deposition of organosilicon layers on glass plates of large dimensions. The invention also relates to a glass substrate covered by thin layers including at least one metal layer, in particular silver, on which the organosilicon layer is deposited according to the process.

REFERENCES:
patent: 4252837 (1981-02-01), Auton
patent: 4382100 (1983-05-01), Holland
patent: 4407852 (1983-10-01), Sapieha et al.
patent: 4508049 (1985-04-01), Behn et al.
patent: 4599266 (1986-07-01), Nakayama et al.
patent: 4612207 (1986-09-01), Jansen
patent: 4632844 (1986-12-01), Yanagihara et al.
patent: 4693927 (1987-09-01), Nishikawa et al.
patent: 4762730 (1988-08-01), Enke et al.

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