Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Patent
1991-11-13
1993-09-07
Lewis, Michael
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Halogenous component
588206, C01B 701
Patent
active
052426688
ABSTRACT:
An improved process and device for removing free halogen from residual gasses containing up to 15% by volume oxygen. Gaseous hydrocarbons and hydrogen are uniformly dispersed in the residual gasses either simultaneously or sequentially and preferentially reacted with the free halogen present before a competing reaction with oxygen can occur. The dispersion device includes an outer housing member, a centrally disposed second member which transports the residual gas from the burner through the cooling zone, and means for transporting gaseous hydrocarbons and hydrogen from the housing member to the second member for rapid and uniform dispersion in the residual gas stream.
REFERENCES:
patent: 3485577 (1969-12-01), Kraus
patent: 4215095 (1980-07-01), Harris et al.
Cabot Corporation
Gwinnell Harry J.
Hendrickson Stuart L.
Lewis Michael
LandOfFree
Process and device for reducing free halogens in residual gasses does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process and device for reducing free halogens in residual gasses, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and device for reducing free halogens in residual gasses will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-485887