Process and device for reducing free halogens in residual gasses

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component

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Details

588206, C01B 701

Patent

active

052426688

ABSTRACT:
An improved process and device for removing free halogen from residual gasses containing up to 15% by volume oxygen. Gaseous hydrocarbons and hydrogen are uniformly dispersed in the residual gasses either simultaneously or sequentially and preferentially reacted with the free halogen present before a competing reaction with oxygen can occur. The dispersion device includes an outer housing member, a centrally disposed second member which transports the residual gas from the burner through the cooling zone, and means for transporting gaseous hydrocarbons and hydrogen from the housing member to the second member for rapid and uniform dispersion in the residual gas stream.

REFERENCES:
patent: 3485577 (1969-12-01), Kraus
patent: 4215095 (1980-07-01), Harris et al.

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