Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1984-06-13
1985-08-13
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204298, 42218603, 42218621, 42218625, 42218629, C25B 1104, C23C 1500
Patent
active
045348421
ABSTRACT:
The invention relates to the production of plasma. The process according to the invention comprises the steps of: maintaining a gaseous medium in an enclosure at a pressure in the range of 10.sup.-5 to 10.sup.-1 Torr; exciting this gaseous medium in the enclosure by means of UHF waves in the range of one to ten gigahertz, producing a plasma; and maintaining this plasma in the enclosure by means of a magnetic confinement shell comprising many elongated magnetic elements arranged parallel to each other inside the enclosure near the respective interior surfaces, the faces of the magnetic elements which face the interior of the enclosure having alternating polarities. It is more particularly applicable to the microelectronics industry.
REFERENCES:
patent: 4158589 (1979-06-01), Keller
patent: 4316791 (1982-02-01), Taillet
patent: 4401054 (1983-08-01), Matsuo
Schumacher et al., Journal of Applied Physics, vol. 47, No. 3, Mar. 1976, pp. 886-893.
Arnal Yves
Pelletier Jacques
Pomot Claude
Centre National de la Recherche Scientifique "CNRS"
Niebling John F.
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