Patent
1988-03-09
1989-06-06
Gellner, Michael L.
354 79, G03B 708, G03B 1748
Patent
active
048375950
DESCRIPTION:
BRIEF SUMMARY
The invention relates to a process for selective photography with shortened and stored exposure time values or with exposure time values corrected during the exposure process, a measurement spot of variable spatial location as well as exposure field markings being made visible before and after the exposure, as well as to a device for carrying out this process.
German Patent Specification No. 2,619,853 discloses a microphotographic device as an attachment camera for microscopes, which permits an exposure correction during the exposure process by means of a fixedly built-in 50/50 neutral beam splitter. In this case, it is disadvantageous that the beam splitter fixedly disposed in the photographic beam path consumes 50% of the available quantity of light for the exposure control. As a result of this, only 50% of the light passes to the film. As a consequence of this, the exposure times are lengthened by the factor "two". This circumstance has a very disadvantageous effect, especially when--as is customary with special microscopy processes--objects of very low light intensity are to be observed and recorded.
It is therefore the object of the present invention to overcome the disadvantages of known microphotographic devices and processes and to provide a process as well as a device, with which process or with which device a great gain in time can be achieved, especially when large-format camera attachments are employed, and moreover there is an expansion of the photographic recording possibilities, especially of miniature fluorescence exposures with reduced exposure times, which are otherwise no longer possible, in consequence of object destruction with the formerly customary long times. A further partial object consists in furthermore obtaining the advantage of the exposure correction during the exposure for a series of practical cases of application with fluorescence exposures by the selection of the exposure program, i.e. in combining both photography with shortened exposure times and also the selective exposure correction during the exposure.
With a process of the initially mentioned type, this object is achieved, according to the invention, by the features of claim 1, as well as in each instance alternatively by claims 2, 3 or 4. Further refinements are evident from the process claims 5 to 8. The object is furthermore achieved by a device for carrying out the initially mentioned processes according to claim 9; further refinements are evident from the device claims 10 to 14.
An embodiment of the invention is diagrammatically represented in the drawing.
The photographic beam path 16 proceeds from an object 6 to be examined and extends along the optical microscope axis 26 via a photographic eyepiece 19, a beam splitter system 1 and a shutter 20 to the image exposure plane 18, in which, for example, a film can be positioned.
The observation beam path 13 likewise proceeds from the object 6 and is deflected at a splitter surface of a splitter prism disposed in the optical microscope axis 26 into the microscope eyepiece 5, where it passes to the observer 27. A dark flap 12 can, in the working position, keep extraneous light on the observer side away, in the case of specified program functions.
An illumination partial beam path 14 proceeds from a lamp 8, which illumination partial beam path, after passing through a format reticule 3, which moreover exhibits a sharpness cross, and after deflection at an appropriate optical component, onto a 50/50 beam splitter 25, where it it recombined with a further illumination partial beam path 15. The illumination partial beam path 15 likewise proceeds from the lamp 8 and, after two-fold deflection, impinges on a full mirror, which is disposed in the measurement beam path 10 so as to be slidable out and which can be designed also as a rotary mirror 11, and falls from there through a stationary integral measurement diaphragm 23 as well as a detail measurement diaphgram carrier 7, which is disposed immediately therebehind so as to be slidable out and which is held within its pla
REFERENCES:
patent: 3851949 (1974-12-01), Kraft et al.
patent: 4118719 (1978-10-01), Leiter et al.
patent: 4475802 (1984-10-01), Onogi
patent: 4685776 (1987-08-01), Inoue et al.
Hund Andreas
Koch Herbert
Leiter Herbert
Reinheimer Guenter
Ernst Leitz Wetzlar GmbH
Gellner Michael L.
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