Process and device for optimizing the position and the width of

Details Process and device for optimizing the position and the width of Process and device for optimizing the position and the width of

1998-04-23

1999-09-21

Kim, Robert H.

Optics: measuring and testing

By dispersed light spectroscopy

With raman type light scattering

356417, 356419, 356418, G01J 344, G01N 2165

Patent

active

059561360

ABSTRACT:
In an optical fittering device comprising at least two fitters, the first filter (EF1) is tilted by an angle of incidence whose value is adjusted to bring the cut-off limit of the first filter (EF1) closer to one of the sides of the line of the illumination beam (FLA), which reduces the optical density of the first filter, while the association in series of the first (EF1) and second (EF2) filters enables to obtain a high-pass filtering whose global density corresponds to the sum of the densities of the first and second filters and whose cut-off limit is lower than that obtained by a single filter tilted to its optimum angle. A third filter (EF3) mounted in parallel with respect to the first and second filters (EF1 and EF2) enables to obtain, at the level of the common collection path (TCC), a band eliminating filtering whose cut-off limits are positioned on either side of the illumination line with a view to an optimum analysis of the low frequency lines.

REFERENCES:
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patent: 5112127 (1992-05-01), Carrabba et al.
patent: 5377004 (1994-12-01), Owen et al.
patent: 5661557 (1997-08-01), Da Silva et al.
D.F. Bowen et al., "Cascaded Wedge Etalon Filter," IBM Technical Disclosure Bulletin, vol. 34, No. 3, at 91-97 (Aug. 1991).
Konstantin V. Popov et al., "Broadband high-reflection multilayer coatings at oblique angles of incidence," Applied Optics, vol. 36, No. 10, at 2139-2151 (Apr. 1, 1997).
Janis Spigulis et al., "Compact dielectric reflective elements. II. Multichannel filter of closely spaced spectral bands," Applied Optics, vol. 33, No. 28, at 6638-6641 (Oct. 1, 1994).

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