Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Organic polymerization
Patent
1991-06-28
1993-08-31
Schofer, Joseph L.
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Organic polymerization
422145, 422213, 422219, B01F 722
Patent
active
052406830
ABSTRACT:
The present invention relates to a process and a device for introducing a catalytically active powder into a reactor (20) for gas phase alpha-olefin polymerization. The device comprises a storage vessel (3) containing the powder, a metering valve (4) delivering metered quantities of the powder into an intermediate chamber (5) comprising at least one obstacle (6) separating an upper part (5a) of the chamber (5) comprising an auxiliary gas inlet (2a) from a lower part (5b) terminated by an outlet orifice (5c). A connecting pipe (18) connects the outlet orifice (5c) to a mixing device (8) situated on a conveying pipework (15) communicating with the reactor (20). The powder is introduced into the reactor in a dilute suspension form and in a more uniform rate.
REFERENCES:
patent: 3330046 (1967-06-01), Albertus
patent: 3876602 (1975-11-01), Calvert et al.
patent: 3878124 (1975-12-01), Durand et al.
patent: 4018671 (1977-03-01), Andon et al.
patent: 4048412 (1977-01-01), Caumartin et al.
patent: 4260709 (1981-02-01), Durand et al.
patent: 4497904 (1985-12-01), Blaya et al.
patent: 4684703 (1987-08-01), Wagner et al.
patent: 4687381 (1987-08-01), Dumain et al.
patent: 4703094 (1987-08-01), Raufast
Maurel Jean A.
Raufast Charles
BP Chemicals Limited
Schofer Joseph L.
Wu David
LandOfFree
Process and device for introducing a powder into a reactor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process and device for introducing a powder into a reactor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and device for introducing a powder into a reactor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2295936