Process and device for determining of surface structures

Boots – shoes – and leggings

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

364576, 36441325, 73602, 382 4, G06K 900, G01N 2900

Patent

active

052589226

ABSTRACT:
A method and device for determining surface structure and subsurface structures wherein the article to be examined is placed upon a support surface and through a liquid or solid medium ultrasonic waves are directed at the surface and backscattered waves are received and processed. The frequency of the ultrasonic waves is selected to provide information of the subsurface structure to a depth of substantially one wavelength.

REFERENCES:
patent: 3805596 (1974-04-01), Klahr
patent: 4094306 (1978-06-01), Kossoff
patent: 4107775 (1978-08-01), Ott
patent: 4167180 (1979-09-01), Kossoff
patent: 4213183 (1980-07-01), Barron et al.
patent: 4631965 (1986-12-01), DeVadder et al.
patent: 4662222 (1987-05-01), Johnson
patent: 4794546 (1988-12-01), Nicolas
patent: 4817015 (1989-03-01), Insana et al.
patent: 4817016 (1989-03-01), Thompson et al.
patent: 4866614 (1989-09-01), Tam
patent: 4873984 (1989-10-01), Hunt et al.
patent: 4876725 (1989-10-01), Tomko
patent: 4881549 (1989-11-01), Rhyne
patent: 4933976 (1990-06-01), Fishbine et al.
patent: 4977601 (1990-12-01), Bicz
patent: 4995086 (1991-02-01), Lilley et al.
patent: 5029475 (1991-07-01), Kikuchi et al.
patent: 5062297 (1991-05-01), Hashimoto et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process and device for determining of surface structures does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process and device for determining of surface structures, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and device for determining of surface structures will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1762582

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.