Process and device for desulfurization of a gas, comprising...

Chemistry of inorganic compounds – Sulfur or compound thereof – Elemental sulfur

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C423S574100, C423S575000, C423S576200

Reexamination Certificate

active

08062619

ABSTRACT:
A process and apparatus for the treatment of a gas that contains hydrogen sulfide and sulfurous anhydride, in which: a) the gas (3) contacts with an organic solvent (1) containing a catalyst in a gas-liquid reactor-contactor (2) so as to recover separately liquid sulfur and; a gas effluent containing sulfur vapor; subjecting the gas effluent to a first condensation zone (7) operating at 70-100° C. to deposit the sulfur in solid form on sufficiently cold walls of the equipment in zone (7), recovering resultant purified gas containing less than 30 ppm by volume of sulfur melting the deposited solid sulfur to regenerate the equipment, and recycling resultant liquefied sulfur to the reactor contactor.

REFERENCES:
patent: 2876071 (1959-03-01), Updegraff
patent: 4391791 (1983-07-01), Palm et al.
patent: 4601330 (1986-07-01), Palm et al.
patent: 5807410 (1998-09-01), Borsboom et al.
patent: 5951961 (1999-09-01), Viltard et al.
patent: 6210454 (2001-04-01), Viltard et al.
patent: 6413488 (2002-07-01), Smith et al.
patent: 1902769 (2008-03-01), None
patent: 2753395 (1998-03-01), None
patent: 0900451 (2009-09-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process and device for desulfurization of a gas, comprising... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process and device for desulfurization of a gas, comprising..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and device for desulfurization of a gas, comprising... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4268410

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.