Process and device for coating a substrate surface with vaporize

Details Process and device for coating a substrate surface with vaporize Process and device for coating a substrate surface with vaporize

1996-12-24

1998-09-08

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of coating supply or source outside of primary...

427563, 427564, 427566, 427567, B05D 306

Patent

active

058042580

ABSTRACT:
In a process for coating a substrate surface with a layer of inorganic material, the inorganic material is vaporised in a vacuum chamber evacuated to at least 10.sup.-3 mbar by bombarding with an electron beam from a high voltage electron-beam gun and deposited on the substrate surface. Gas discharging is created between the point of incidence (A) of the electron beam on the inorganic material to be vaporised and an anode such that the electrostatic charge created by the high voltage electron-beam gun flows off via the anode. This way damage to the substrate, which may arise as a result discharging phenomena, can be effectively avoided.

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"Low voltage--high current Discharge of Ti vapor in High Vaccum", Kajioka H et al. Thin Solid Films, Bd. 256, Nos. 1/02, Feb. 1, 1995, pp. 124-135.

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