Process and composition for drying of gaseous hydrogen halides

Details Process and composition for drying of gaseous hydrogen halides Process and composition for drying of gaseous hydrogen halides

1989-05-25

1990-05-15

Russel, Jeffrey E.

Chemistry of inorganic compounds

Halogen or compound thereof

Hydrogen halide

423210, B01D 5302, C01B 700

Patent

active

049256467

ABSTRACT:
A process for drying a gaseous hydrogen halide of the formula HX, wherein X is bromine, Chlorine, FLuorine, or iodine, to remove water impurity therefrom, in which a scavenger precursor composition is provided, including a support having associated therewith partially or fully alkylated metal alkyl compounds or pendant groups. The precursor composition is reacted with gaseous hydrogen halide to convert the metal alkyl compounds and/or pendant functional groups to the corresponding metal halide compounds and/or pendant functional groups, which in turn react with the water impurity to produce an essentially completely water-free (below 0.1 ppm) gaseous hydrogen halide effluent. The process of the invention has utility for producing high purity, anhydrous gaseous hydrogen halides for semiconductor manufacturing operations.

REFERENCES:
patent: 1041608 (1912-10-01), Edeleanu
patent: 2321282 (1943-06-01), Comstock
patent: 3067009 (1962-12-01), Murib et al.
patent: 3146061 (1964-08-01), Murib et al.
patent: 3997652 (1976-12-01), Teller
patent: 4603148 (1986-07-01), Tom
CRC Handbook of Chemistry and Physics, 62nd Edition.
CRC Press, Inc. Boca Ratan, Florida, 1981, pp. B-73, B-86, B-87, B-113, B-114, B-115, and B-116.

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