Process and composition for drying of gaseous hydrogen halides

Compositions – Humidostatic – water removive – bindive – or emissive

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

2521816, 2521817, 34 80, 34DIG1, 423240, C09K 300

Patent

active

048531480

ABSTRACT:
A process for drying a gaseous hydrogen halide of the formula HX, wherein X is selected from the group consisting of bromine, chlorine, fluorine, and iodine, to remove water impurity therefrom, comprising:
contacting the water impurity-containing gaseous hydrogen halide with a scavenger including a support having associated therewith one or more members of the group consisting of:

REFERENCES:
patent: 3067009 (1962-12-01), Murib et al.
patent: 3146061 (1964-08-01), Murib et al.
patent: 3997652 (1976-12-01), Teller
patent: 4603148 (1986-07-01), Tom
CRC Handbook of Chemistry and Physics, 62nd Ed., CRC Press, Inc., Boca Raton, Fla., 1981, pp. B-73, B-86, B-87, B-113, B-114, B-115, B-116.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process and composition for drying of gaseous hydrogen halides does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process and composition for drying of gaseous hydrogen halides, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and composition for drying of gaseous hydrogen halides will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-129728

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.