Process and apparatus for vapor transfer of very high purity liq

Details Process and apparatus for vapor transfer of very high purity liq Process and apparatus for vapor transfer of very high purity liq

1989-03-14

1990-02-27

Miles, Tim

Gas and liquid contact apparatus

Fluid distribution

Valved

2611211, B01F 304

Patent

active

049044192

ABSTRACT:
By the present invention, a high purity liquid is vapor transported by a carrier gas from a bubbler system at room temperature. The bubbler system uses a split flow path for developing a predetermined high dilution ratio without the need for refrigeration. The quartz inner chamber containing the liquid is contained within and protected by a sturdy outer chamber. Two valves control the bubbler system and allow the internals of the system to be purged of all moisture and impurities before operative use. The lengths and diameters of the flow path tubes are calibrated to enable development of a highly diluted, predetermined vapor-to-carrier-gas ratio for a given total flow rate of carrier gas.

REFERENCES:
patent: 2205559 (1940-06-01), Heftler et al.
patent: 2504009 (1050-04-01), Phillips et al.
patent: 2912018 (1959-11-01), Leech
patent: 2981526 (1961-04-01), Grumbach
patent: 3590902 (1971-07-01), Walker
patent: 3766914 (1973-10-01), Jacobs
patent: 3925033 (1975-12-01), Mayo
patent: 4563312 (1986-01-01), Takimoto et al.
patent: 4591464 (1986-05-01), Kaneno et al.

Affiliated with

Also associated with

Rating

Process and apparatus for vapor transfer of very high purity liq does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process and apparatus for vapor transfer of very high purity liq, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and apparatus for vapor transfer of very high purity liq will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-172377