Process and apparatus for treating contaminated gas

Details Process and apparatus for treating contaminated gas Process and apparatus for treating contaminated gas

2005-06-28

2005-06-28

Silverman, Stanley S. (Department: 1754)

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Organic component

C588S253000

Reexamination Certificate

active

06911190

ABSTRACT:
The present invention provides a process and apparatus for treating contaminated gas. A contaminated gas containing volatile organic compounds is continuously introduced into a reactor to allow the gas to contact a metal oxide catalyst and an oxidant for a period of time. The concentration of the volatile organic compounds can be thus reduced. The treated gas is then continuously emitted from the reactor. The concentration of the organic compounds of the emitted gas and/or the concentration of the oxidant are continuously monitored, and the oxidant feeding amount is controlled according to the monitored concentration. By means of the process of the present invention, volatile organic compound-containing waste gas with high humidity can be effectively treated, and the utility rate of the oxidant can be increased.

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