Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1993-06-04
1995-04-04
Beck, Shrive
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
427348, 427271, 427596, 21912184, 156637, 156643, B05D 300, B05D 500, B05D 118
Patent
active
054036275
ABSTRACT:
A process for treating a predetermined portion of a coating on a photoreceptor to remove at least part of the coating involves directing a source of high energy irradiation at the coating in the presence of at least one fluid medium to remove at least part of the coating from the predetermined portion of the coating. The source of high energy irradiation is preferably a laser beam, ultrasonic energy, or a source of high intensity heat. The at least one fluid medium is preferably at least one gas jet, liquid jet or a liquid solvent.
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IBM Technical Disclosure Bulletin, vol. 33, No. 9, Feb. 1991, pp. 329-330 "Debris Elimination Following Laser Etching".
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IBM Technical Disclosure Bulletin, vol. 12, No. 6, Nov. 1969, p. 735 "Laser Removal of Polymer Coating".
Herbert William G.
Hordon Monroe J.
Klein Alfred O.
Maier Gary J.
Mastalski Henry T.
Beck Shrive
Talbot Brian K.
Xerox Corporation
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