Specialized metallurgical processes – compositions for use therei – Processes – Free metal or alloy reductant contains magnesium
Patent
1990-04-11
1992-02-11
Silverman, Stanley S.
Specialized metallurgical processes, compositions for use therei
Processes
Free metal or alloy reductant contains magnesium
266217, 266233, 75699, 210758, 210220, 2102211, 261 77, 2611211, 261DIG75, C22B 905
Patent
active
050872923
ABSTRACT:
The invention relates to the treatment of a liquid with a gas. A gas injector, for example oxygen, is surrounded with a sheath to carry a flow of a liquid under treatment (for example lead) which is taken up and circulated by the pump. The end of the injector is thereby protected by moving away the bubbles of oxygen. Application for example in the refining of metals, for example non ferrous metals, food liquids, paper pulps and the production of sulfur.
REFERENCES:
patent: 2054316 (1936-09-01), Gilbert
patent: 3791813 (1974-02-01), Ramachandran et al.
patent: 3794303 (1974-02-01), Hirshon
patent: 3804255 (1974-04-01), Speece
patent: 4169584 (1979-10-01), Mangalick
patent: 4179375 (1979-12-01), Smith
patent: 4255262 (1981-03-01), O'Cheskey et al.
patent: 4328958 (1982-05-01), Dolzhenkov et al.
patent: 4355789 (1982-10-01), Dolzhenkov et al.
patent: 4564457 (1986-01-01), Cairo, Jr. et al.
patent: 4824579 (1989-04-01), George
patent: 5028035 (1991-07-01), Baud et al.
Patents Abstracts of Japan, vol. 7, No. 53 (C-154), Mar. 3, 1983; JP-A-57 203 728, 12/14/1982.
L'Air Liquide, Societe Anonyme pour l'Etude et l Exploitation de
McCarthy Neil M.
Silverman Stanley S.
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