Process and apparatus for the separation of p-xylene in C.sub.8

Chemistry of hydrocarbon compounds – Purification – separation – or recovery – By plural serial diverse separations

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

585814, 585825, 585828, 585831, C07C 700, C07C 712, C07C 714

Patent

active

052849929

ABSTRACT:
To continuously produce and separate high purity p-xylene from a C.sub.8 aromatic hydrocarbon charge, successive use is made in combination of (1) a stage of separating low-purity p-xylene (75 to 98%) by simulated moving bed adsorption chromatography, with a ratio of the solvent to charge flow rates ob 1.2 to 2.5; (2) a stage of purifying and washing the low-purity p-xylene by recrystallization (-25.degree. to +10.degree. C.); (3) a stage of catalytic isomerization of the charge which has been p-xylene-depleted by the separating stage (1); and recovering an isomerate which si then recycled to the charge. The solvent for desorption in stage (1) and washing in stage (2) is advantageously toluene.

REFERENCES:
patent: 3813452 (1974-05-01), Bieser
patent: 3948758 (1976-04-01), Bonacci et al.
patent: 3959978 (1976-06-01), Lindley et al.
patent: 4118429 (1978-10-01), Fritsch
patent: 4402832 (1983-09-01), Gerhold
patent: 4498991 (1985-02-01), Oroskar
Patent Abstracts of Japan, vol. 5, No. 12 (C-40)(684) Jan. 24, 1981 and JP-A-55 139 327 (Nippon Kihatsuyu K.K.) Oct. 31, 1980.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process and apparatus for the separation of p-xylene in C.sub.8 does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process and apparatus for the separation of p-xylene in C.sub.8 , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and apparatus for the separation of p-xylene in C.sub.8 will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-699237

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.