Process and apparatus for the manufacture of a sputtering...

Coating processes – Spray coating utilizing flame or plasma heat

Reexamination Certificate

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C204S298120

Reexamination Certificate

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07964247

ABSTRACT:
A process for the manufacture of sputtering target comprises the steps of i) providing a substrate; ii) plasma melting of a material selected to form the sputtering target, yielding droplets of molten material; and iii) deposition of the droplets onto the substrate, yielding a sputtering target comprised of the coated layer of the material on the substrate. In some application, it might be preferable that the substrate be a temporary substrate and iv) to join the coated temporary target via its coated layer to a permanent target backing material; and v) to remove the temporary substrate, yielding a sputtering target comprised of the coated layer of the material on the permanent target backing material. The plasma deposition step is carried out at atmospheric pressure or under soft vacuum conditions using, for example, d.c. plasma spraying, d.c. transferred arc deposition or induction plasma spraying. The process is simple and does not require subsequent operation on the resulting target.

REFERENCES:
patent: 3547720 (1970-12-01), Jones
patent: 4120930 (1978-10-01), Lemelson
patent: 4908261 (1990-03-01), Ishii et al.
patent: 4934049 (1990-06-01), Kiekhafer et al.
patent: 5338425 (1994-08-01), Mishima et al.
patent: 5356674 (1994-10-01), Henne et al.
patent: 5709783 (1998-01-01), Sanchez et al.
patent: 5744777 (1998-04-01), Bernecki et al.
patent: 6193856 (2001-02-01), Kida et al.
patent: 7175802 (2007-02-01), Sandlin et al.
patent: 2005/0208218 (2005-09-01), Becker et al.
patent: 41 15 663 (1992-11-01), None
patent: 0 522 369 (1993-01-01), None
patent: 1 350 861 (2003-10-01), None
patent: 1 410 169 (1975-10-01), None
DE4115663 (machine translation).
DE 4115663 (machine translation) (1992).
Anonymous: “Process for Fabricating Sputtering Targets”, Research Disclosure, Kenneth Mason Publications, Hampshire, GB, vol. 300, No. 82, Apr. 1989.
Patent Abstracts of Japan, vol. 1995, No. 03, Apr. 28, 1995.
Patent Abstracts of Japan, vol. 0120, No. 05 (C-467).
Anonymous: “Process for Fabricating Sputtering Targets”, Research Disclosure, Kenneth Mason Publications, Hampshire, GB, vol. 300, No. 82, Apr. 1989.
Patent Abstracts of Japan, vol. 1995, No. 03, Apr. 28, 1995.
Patent Abstracts of Japan, vol. 0120, No. 05 (C-467) (1988).

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