Electric lamp or space discharge component or device manufacturi – Process – With assembly or disassembly
Patent
1997-07-23
2000-02-29
Patel, Nimeshkumar D.
Electric lamp or space discharge component or device manufacturi
Process
With assembly or disassembly
H01J 900
Patent
active
060302666
ABSTRACT:
Process and apparatus for the formation of patterns in a photosensitive resin layer or photoresist by continuous laser irradiation, application to the production of microtip emissive cathode electron sources and flat display screens. Formation takes place of non-mutually interfering elementary light beams (41), there is at least one relative translation at constant light power and speed of said beams with respect to the layer in order to irradiate lines thereof, each line receiving a light dose lower than that necessary for the development of the resin, a relative rotation of all the beams with respect to the layer takes place, the translation is recommenced in order to irradiate other lines, each line receiving a light dose complimentary to the preceding dose and the resin is developed.
REFERENCES:
patent: 4857161 (1989-08-01), Borel et al.
patent: 5194780 (1993-03-01), Meyer
patent: 5415835 (1995-05-01), Brueck et al.
patent: 5534744 (1996-07-01), Leroux et al.
patent: 5669800 (1997-09-01), Ida et al.
patent: 5759744 (1998-06-01), Brueck et al.
J.P. Spallas, et al., IVMC Conference, 1995, "Large Scale Field Emitter Array Patterning For Flat Panel Displays Using Laser Interference Lithography".
Carol O. Bozler, et al., Journal of Vacuum Science & Technology, vol. 12, No. 2, pp. 629-632, Mar./Apr. 1994, "Arrays of Gated Field-Emitter Cones Having o.32 UM Tip-To-Tip Spacing".
J.M. Carter, et al., Journal of Vacuum Science & Technology, vol. 10, No. 6, pp. 2909-2911, Nov./Dec. 1992, "Large-Area, Free-Standing Gratings For Atom Interferometry Produced Using Holographic Lithography".
Michel De Labachelerie, Japon Optoelectronique, No. 17, pp. 16&17, Dec. 1993-Feb. 1994, "Lighographie Tridimensionnelle Par Exposition A Niveaux De Gris".
Masamitsu Haruna, et al., Applied Optics, vol. 29, No. 34, pp. 5120-5126, Dec. 1, 1990, "Laser Beam Lithographed Micro-Fresnel Lenses".
Theresa R. Jay, et al., Miniature and Micro-Optics and Micromechanics, SPIE vol. 1992, pp. 275-282, 1993, "Preshaping Photoresist For Refractive Microlens Fabrication".
Y. Oppliger, et al., Microelectronic Engineering, vol. 23, pp. 449-454, 1994 "One-Step 3D Shaping Using a Gray-Tone Mask for Optical and Microelectronic Applications".
Georges Przyrembel, pp. 219-228, "Continuous-Relief Microoptical Elements Fabricated by Laser Beam Writing".
H.J. Quenzer, et al., pp. 163-172, "Fabrication of Relief-Topographic Surfaces with a One-Step Uv-Litographic Porcess".
T.A. Savas, et al., Journal of Vacuum Science & Technology B., vol. 13, No. 6, pp. 2732-2735, Nov./Dec. 1995, "Achromatic Interferometric Lithography for 100-NM-Period Gratings and Grids".
Joerg Wengelink, et al., pp. 209-217, "Generation of Relief-Type Surface Topographies for Integrated Microoptical Elements".
J. P. Spallas, et al., Journal of Vacuum Science & Technology B, vol. 13, No. 5, pp. 1973-1978, Sep./Oct. 1995, "Field Emitter Array Mask Patterning Using Laser Interference Lithography".
Ida Michel
Rabarot Marc
Commissariat a l''Energie Atomique
Patel Nimeshkumar D.
Smith Michael J.
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