Gas separation – Means within gas stream for conducting concentrate to collector
Patent
1981-12-08
1984-02-14
Spitzer, Robert H.
Gas separation
Means within gas stream for conducting concentrate to collector
55 58, 55 62, 55 68, 55 75, B01D 5304
Patent
active
044314329
ABSTRACT:
The invention relates to a process and apparatus for separating mixed gas by adsorption in which adsorption and desorption steps are repeatedly carried out in a plurality of adsorption towers in staggered timings.
The invention is characterized in that upon commencement of the desorption step, mixed gas having a low adsorbate constituent gas concentration which is delivered in the initial part of a pressure-reducing period (a primary pressure-reducing period) in an adsorption tower which has completed adsorption, is fed into an adsorption tower which has finished pressure-reduction to scavenge and desorb the adsorbate constituent gas adsorbed by an adsorbent, whereby enhancement of a yield of an unadsorbate gas can be achieved as compared to scavenging desorption making use of a part of an unadsorbate gas delivered during an adsorption step.
REFERENCES:
patent: 3085379 (1963-04-01), Kiyonaga et al.
patent: 3430418 (1969-03-01), Wagner
patent: 3564816 (1971-02-01), Batta
patent: 3796022 (1974-03-01), Simonet et al.
patent: 3797201 (1974-03-01), Tamura
patent: 3923477 (1975-12-01), Armond et al.
patent: 3988129 (1976-10-01), Fornoff et al.
patent: 4077779 (1978-03-01), Sircar et al.
Amitani Tatsuo
Izumi Jun
Kubo Masayoshi
Maehara Kenichi
Tsutaya Hiroyuki
Mitsubishi Jukogyo Kabushiki Kaisha
Spitzer Robert H.
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