Process and apparatus for producing porous quartz glass base

Details Process and apparatus for producing porous quartz glass base Process and apparatus for producing porous quartz glass base

2007-08-08

2010-10-12

Chen, Bret (Department: 1715)

Glass manufacturing

Processes of manufacturing fibers, filaments, or preforms

C065S436000, C427S452000, C427S189000, C427S574000, C427S588000

Reexamination Certificate

active

07810356

ABSTRACT:
The present invention provides a process for producing a porous quartz glass base, which comprises hydrolyzing a silicon compound in an oxyhydrogen flame in a reaction furnace to generate and deposit fine silica particles on a starting member, thereby forming a porous quartz glass base, wherein a gas discharge pipe for discharging an unnecessary gas from the reaction furnace is heated. According to the present invention, fine silica particles can be prevented from adhering to a gas discharge pipe for discharging the unnecessary hydrogen chloride gas generated in producing a porous quartz glass base.

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Isobe, Hiroshi, et al., “Porous Silica Particles Prepared from Silicon Tetrachloride Using Ultrasonic Spray Method”. Journal of Colloid and Interface Science, 212, pp. 234-241 (1999).

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