Coating processes – Direct application of electrical – magnetic – wave – or... – Resistance heating
Patent
1995-09-26
1998-03-10
Nguyen, Nam
Coating processes
Direct application of electrical, magnetic, wave, or...
Resistance heating
427572, 427586, 438792, 2041921, B05D 512
Patent
active
057259143
ABSTRACT:
In order to improve a process and an apparatus for producing a functional structure of a semiconductor component, which comprises layers arranged on a base substrate and defining the entire functions of the semiconductor component, such that the functional structure of the semiconductor components can be produced as simply as possible and with as little susceptibility as possible with respect to the quality of the semiconductor components it is suggested that all the layers be produced without lithography and applied to the base substrate one after the other exclusively with physical layer application processes.
REFERENCES:
patent: 4335266 (1982-06-01), Mickelsen et al.
patent: 4432855 (1984-02-01), Romankiw et al.
patent: 4497692 (1985-02-01), Gelchinski et al.
patent: 4664940 (1987-05-01), Bensoussan et al.
patent: 4724219 (1988-02-01), Ridinger
patent: 4868068 (1989-09-01), Yamaguchi et al.
patent: 4895735 (1990-01-01), Cook
patent: 4970196 (1990-11-01), Kim et al.
patent: 5015492 (1991-05-01), Venkatesan et al.
patent: 5017277 (1991-05-01), Yoshida et al.
patent: 5037521 (1991-08-01), Nishikawa et al.
patent: 5080455 (1992-01-01), King et al.
patent: 5084300 (1992-01-01), Zander et al.
patent: 5097793 (1992-03-01), Shuhara et al.
patent: 5158931 (1992-10-01), Noda et al.
patent: 5174881 (1992-12-01), Iwasaki et al.
patent: 5207884 (1993-05-01), Char et al.
patent: 5209944 (1993-05-01), Opower et al.
patent: 5231047 (1993-07-01), Ovshinsky et al.
patent: 5242706 (1993-09-01), Cotell et al.
patent: 5246885 (1993-09-01), Braren et al.
patent: 5248658 (1993-09-01), Yamazaki
patent: 5324552 (1994-06-01), Opower et al.
patent: 5361275 (1994-11-01), Opower
Shao, et al., "Polycrystalline CdTe Solar Cells by Pulsed Laser Deposition," Abstract from Twenty-Second IEEE Photovoltaic Specialists Conference, 1991, p. 957.
M. Hanabusa, "Photo-Excited Processes Related to Semiconductor Technology," Thin Solid Films, vol. 218 (1992), pp. 144-150.
Y. Hiura, et al., "Laser Chemical Vapor Deposition Direct Patterning of Insulating Film," Journal of Applied Physics, vol. 69(3), Feb. 1, 1991, pp. 1744-1747.
V. M. Donnelly, et al., "Selected Area Growth of GaAs by Laser-Induced Pyrolysis of Adsorbed Triethylgallium," Applied Physics Letters, vol. 54(24), Jun. 12, 1989, pp. 2458-2460.
J. Brannon, "Excimer Laser Induced Micron-Size Pattern Etching by Image Projection," Materials Research Society Symposium Proceedings, vol. 101, Dec. 1-3, 1987, pp. 27-31.
Deutsche Forschungsanstalt fuer Luft - und Raumfahrt e.V.
Hoppin Ralph F.
Lipsitz Barry R.
Nguyen Nam
LandOfFree
Process and apparatus for producing a functional structure of a does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process and apparatus for producing a functional structure of a , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and apparatus for producing a functional structure of a will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-137539