Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Patent
1985-08-05
1987-11-10
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Crucible or evaporator structure
118715, 219274, 261122, 261123, 261104, 261DIG65, C23C 1600
Patent
active
047049880
ABSTRACT:
The invention relates to a process and an apparatus for obtaining a gaseous stream containing a compound in the vapor state, more particularly usable for introducing said compound into a vapor phase epitaxy reactor.
The process consists of introducing the compound into the first compartment of an enclosure subdivided into first and second compartments by a porous partition, raising to a given temperature the first compound of the enclosure so as to evaporate the compound, circulating within the second compartment a carrier gas able to entrain the evaporated compound and extracting from the second compartment the carrier gas containing the evaporated compound which has diffused into the second compartment by passing through the porous partition.
By regulating the temperature, it is possible to control the flowrate of the compound diffused through the partition and by regulating the flowrate of the carrier gas in the second compartment, it is possible to regulate to the desired value the partial pressure of the compound in the gaseous stream leaving the enclosure by the pipe.
REFERENCES:
patent: 3459668 (1969-08-01), Schmit
Powell et al., Vapor Deposition, John Wiley and Sons, New York, .COPYRGT.1966, pp. 269-274.
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