Optics: measuring and testing – Plural test
Reexamination Certificate
2006-05-23
2006-05-23
Toatly, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
Plural test
C356S630000
Reexamination Certificate
active
07050160
ABSTRACT:
A process for measuring both the reflectance and sheet resistance of a thin film, such as a metal film or a doped semiconductor, in a common apparatus comprises: directing a beam of radiation from a radiation source on the common apparatus onto a portion of the surface of the thin film, sensing the amount of radiation reflected from the surface of the thin film, and contacting the surface of the thin film with a sheet resistance measurement apparatus on the apparatus at a portion of the surface of the thin film coincident with or adjacent to the portion of the thin film contacted by the radiation beam to measure the sheet resistance of the thin film. The sheet resistance measurement apparatus may, by way of example, comprise a 4 point probe or an eddy current measurement apparatus. The respective measurements may be carried out either simultaneously or sequentially. By deriving the resistivity of the thin film from the measured reflectance at any particular region of the thin film surface, the thickness of the thin film, at that region of the film, may be obtained by dividing the derived resistivity by the measured sheet resistance for that same region.
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Johnson Walter H.
Kalyanam Jagadish
Krishnan Shankar
Narasimhan Murali K.
KLA-Tencor Technologies Corporation
Punnoose Ray M.
Taylor John P.
Toatly, Jr. Gregory J.
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