Process and apparatus for etching copper base materials

Details Process and apparatus for etching copper base materials Process and apparatus for etching copper base materials

1987-01-12

1988-02-16

Schor, Kenneth M.

Compositions

Etching or brightening compositions

Inorganic acid containing

252 793, 156666, C09K 1304, C23F 100

Patent

active

047253746

ABSTRACT:
A solution for etching copper or a copper base material, the solution consisting essentially of peroxydisulfuric acid, being present in an amount of from about 0.5N up to about 6.0N, with chloride or fluoride present in an amount of from about 10 ppm up to about 500 ppm, and the balance water is described.

REFERENCES:
patent: 2982625 (1961-05-01), Saubestre
patent: 3470044 (1969-09-01), Radimer
patent: 3917521 (1975-11-01), Clarke et al.
patent: 3936332 (1976-02-01), Matsumoto et al.
patent: 3939089 (1976-02-01), Matsumoto et al.
patent: 4085016 (1978-04-01), Janjua et al.
patent: 4110237 (1978-08-01), Matsumoto et al.
patent: 4144144 (1979-03-01), Radimer et al.
patent: 4482440 (1984-11-01), Kadija
CRC Handbook of Chemistry and Physics, 61st edition, 1980-1981, CRC Press, p. B-154.

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