Photography – Fluid-treating apparatus – Photographic medium or cartridge sensing
Patent
1997-11-12
1999-07-27
Rutledge, D.
Photography
Fluid-treating apparatus
Photographic medium or cartridge sensing
396578, 396626, 396571, G03D 1300
Patent
active
059305479
ABSTRACT:
An apparatus for developing radiation-sensitive, exposed printing forms into printing plates is disclosed. The apparatus has a developer pan in which a developer bath 2 is situated. The individual printing form runs through the developing station of this apparatus in a running-through plane. On both sides of the running-through plane there are a first pair of transport rollers, two brushing rollers with their counter-rollers and a second pair of transport rollers at the end of the developing station. Arranged between the first pair of transport rollers and the first brushing roller with its counter-roller, on the underside of the running-through plane, are guide rollers. A closed vessel, filled with developing solution, is connected via a developer circuit and a pump to the developer bath. In the vessel there are a temperature sensor and a measuring electrode for the electric conductivity of the developing solution. The temperature sensor and the measuring electrode are connected to a computer, so too is a sensor, which is arranged underneath a feeding table for the printing forms. Data, such as formats of the printing forms, characteristic lines of the specific conductivity of the developing solution for various printing form types, set temperature values and temperature coefficients for the conductivity of the developing solution, are stored in the computer. The computer is also connected to pumps for metered feeding of developing replenisher and water into the developer bath and to a cooling device as well as a heating device within the developer bath.
REFERENCES:
patent: 4566948 (1986-03-01), Lawson et al.
patent: 4882246 (1989-11-01), Ohba et al.
patent: 4952958 (1990-08-01), Ohba et al.
patent: 4969002 (1990-11-01), Nakayama
patent: 4977067 (1990-12-01), Yoshikawa et al.
patent: 5138353 (1992-08-01), Ohba et al.
patent: 5217848 (1993-06-01), Uehara et al.
Tipler, Physics, vol. 2, pp. 767, 890-891 & 930-933 (1976).
Patent Abstract, JP-A-59 121 047, vol. 008, No. 248 (P-313)14, Nov. 14, 1984.
Patent Abstract, JP-A-61 061 164, vol. 010, No. 225 (P-484)6, Aug. 6, 1986.
Patent Abstract, JP-A-22 67 560, vol. 015, No. 023 (P-1155)18, Jan. 18, 1991.
Patent Abstract, JP-A-31 77 843, vol. 015, No. 430 (P-1270)31, Oct. 31, 1991.
Patent Abstract, JP-A-40 15 653, vol. 016, No. 171 (P-1343)24 Apr. 24,1992.
Patent Abstract, JP-A-11 80 548, vol. 013, No. 464 (P-947)20, Oct. 20, 1989.
Patent Abstract, JP-A-60 252 351, vol. 010, No. 127 (P-455)(2184), May 136, 1986.
Patent Abstract, JP-A-60 257 449, vol. 010, No. 135 (P-457)(2192), May 20,1986.
Juergensen Peter Jessen
Stein Eckehard
Agfa-Gevaert AG
Rutledge D.
LandOfFree
Process and apparatus for developing radiation-sensitive, expose does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process and apparatus for developing radiation-sensitive, expose, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and apparatus for developing radiation-sensitive, expose will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-890767