Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Lumped type parameters
Patent
1989-06-23
1991-02-05
Eisenzopf, Reinhard J.
Electricity: measuring and testing
Impedance, admittance or other quantities representative of...
Lumped type parameters
324459, 324615, 324711, 324629, 422186, 20429803, G01R 2728
Patent
active
049908596
ABSTRACT:
A method and apparatus for determining the impedance of the discharge in a plasma reactor system comprising a tuning box having variable capacitors is described. The impedance of the discharge is determined in dependence on a pre-established relationship between the operational positions of the variable capacitors on the one hand and the impedance of the discharge on the other. The ionic current relative to the discharge in the reactor also may be determined by taking into account the high frequency voltage of the reactor.
REFERENCES:
patent: 3569777 (1971-03-01), Beaudry
patent: 4207137 (1980-06-01), Tretola
Mazza, "Automatic Impedance Matching System for RF Sputtering", IBM J. Res. Develop., vol. 14, No. 2 (Mar. 1970), pp. 192-193.
Jackson, "Electrical Characteristics of Double Electrode RF Sputtering Systems -1. The Discharge", Vacuum, vol. 21, No. 11 (Sep. 1971), pp. 533-538.
Norstrom, "Experimental and Design Information for Calculating Impedance Matching Networks for Use in RF Sputtering and Plasma Chemistry", Vacuum, vol. 29, No. 10 (Jun. 1979), pp. 341-350.
The Bell System Technical Journal, vol. 55, No. 6; Jul.-Aug. 1976, pp. 691-721; J. G. Evans et al.: "Automated Network Analyzers for the 0.9- to 12.4-GHz Range"; p. 695, point 3.1-p. 695, line 3.
Andries Bernard
Bouyer Bernard
Peccoud Louise
Ravel Guillaume
Commissariat a l''Energie Atomique
Eisenzopf Reinhard J.
Mueller Robert W.
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