Boots – shoes – and leggings
Patent
1987-05-04
1989-07-11
Lall, Parshotam S.
Boots, shoes, and leggings
364550, 156626, 156345, H01L 21306, C23F 102
Patent
active
048477923
ABSTRACT:
An apparatus and process for detecting aberrations in production process operations is provided. In one embodiment, operations of a plasma etch reactor (10) are monitored to detect aberrations in etching operations. A reference end-point trace (EPT) is defined (50), regions are defined in the reference EPT (52) and characteristics and tolerances for each region are defined (54). The etcher is run (56) and an actual EPT is obtained from the running of the etcher. The actual EPT is analyzed (58) by comparing characteristics of the regions of the actual EPT with characteristics of corresponding regions of the reference EPT. If the characteristics of the actual EPT exceed those of the reference EPT by predefined tolerances (62) a signal is generated (68). The system also checks for aberrations which are manifested by predefined EPT characteristics and signals when those are detected.
REFERENCES:
patent: 3985712 (1976-10-01), Garst
patent: 4493745 (1985-01-01), Chen et al.
patent: 4504920 (1985-03-01), Mickowski
patent: 4609426 (1986-09-01), Ogawa et al.
patent: 4611919 (1986-09-01), Brooks, Jr. et al.
patent: 4615761 (1986-10-01), Trada et al.
patent: 4675072 (1987-06-01), Bennett et al.
Khoury; "Real-Time Etch Plasma Monitor System"; IBM Technical Disclosure, vol. 25, No. 11A, Apr. 1983.
Marcoux et al; "Methods of End Point Detection for Plasma Etching"; H. P. Laboratories; Apr. 1981.
Barna Gabriel G.
Ratliff Charles
Bassuk Lawrence J.
Demond Thomas W.
Lall Parshotam S.
Ramirez Ellis B.
Sharp Melvin
LandOfFree
Process and apparatus for detecting aberrations in production pr does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process and apparatus for detecting aberrations in production pr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and apparatus for detecting aberrations in production pr will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-442050