Process and apparatus for controlling the melt level while pulli

Details Process and apparatus for controlling the melt level while pulli Process and apparatus for controlling the melt level while pulli

1993-08-18

1995-08-01

Kunemund, Robert

Single-crystal, oriented-crystal, and epitaxy growth processes;

Processes of growth from liquid or supercritical state

Having pulling during growth

117 15, 117 30, 117201, 117208, 117217, C30B 1526

Patent

active

054372429

ABSTRACT:
A process and an apparatus for carrying out the process provides for the accurate and simple control of the melt level when pulling single crystals according to the Czochralski process. The process comprises disposing a mechanical reference mark above the melt in such a way that it causes a reflection from the melt surface. An image of the metal surface is then recorded, and with the aid of the recorded image the distance of the mechanical reference mark from the melt surface is determined. An actual signal proportional to this distance is then generated and is compared with a set point signal, and the melt level is changed as a function of any difference observed.

REFERENCES:
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patent: 4330362 (1982-05-01), Zulehner
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patent: 4454096 (1984-06-01), Lorenzini et al.
patent: 4915775 (1990-04-01), Katsuoka et al.
patent: 5170061 (1992-12-01), Baba
Patent Abstract of Japan, C. Field, vol. 13, No. 273, Jun. 22, 1989 The Pnt Office Japanese Government, p. 157 C 609.
Patent Abstracts of Japan, C. Field, vol. 9, No. 171, Jul. 16, 1985 The Patent Office Japanese Government, p. 66 C 291, No. 60-42 294.
Patent Abstracts of Japan, C. Field, vol. 9, No. 171, Jul 16, 1985 The Patent Office Japanese Government, p. 66 C 291, No. 60-42 296.

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